Schematics of the experimental process for synthesizing (a) clamped and freestanding thick films, and (b) island structure.
Clamped, island, and freestanding films exhibiting two kinds of clamping, one arising from the substrate and other from the inactive area of film.
Plane and cross-sectional SEM images of [(a) and (b)] clamped and [(c) and (d)] freestanding thick films. (e) Optical microscopy picture of the island structure, and (f) Residual stress analysis of the clamped film shown in (a) and (b) using high resolution XRD. The stress was computed to be .
(a) Dielectric constant and loss of clamped, island, and freestanding thick films, (b) loop comparison between clamped, island, and freestanding thick films under the sweep of 360 kV/cm with frequency of 100 Hz.
PFM images: (a) clamped thick films and (b) freestanding thick films.
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