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Long term operation of high quantum efficiency GaAs(Cs,O) photocathodes using multiple recleaning by atomic hydrogen
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10.1063/1.3208054
/content/aip/journal/jap/106/5/10.1063/1.3208054
http://aip.metastore.ingenta.com/content/aip/journal/jap/106/5/10.1063/1.3208054

Figures

Image of FIG. 1.
FIG. 1.

Schematic view of the photocathode setup of the Heidelberg TSR electron target.

Image of FIG. 2.
FIG. 2.

Photoelectron QE vs photon energy for a GaAs surface which is chemically treated by HCl (1), cleaned by AH treatment (2), activated by Cs and subsequently heat cleaned (3), fully activated by (Cs,O) with subsequent heat cleaning after degradation [(4)–(6)] and recleaned by AH (7) with an exposure dose of .

Image of FIG. 3.
FIG. 3.

QE ultraviolet spectra from a degraded cathode after heat cleaning (1) and after subsequent AH cleanings with AH exposures of (2), (3), (4), (5), (6), and (7).

Image of FIG. 4.
FIG. 4.

Long-time evolution of QE of two photocathodes. The plot shows the QE obtained by (Cs,O)-activation after each AH cleaning procedure vs integrated AH dose. Two typical samples from different groups, grown by LPE (blue squares) and by MOCVD (red circles), were used. The thick dashed arrow indicates the moment when cleaning with HCl solution in the glovebox was applied to the MOCVD cathode. The two thin arrows indicate small rises of QE folowing AH treatment of higher-than-average dose intensity of about .

Image of FIG. 5.
FIG. 5.

Photoluminescence images of “fresh” MOCVD-photocathode surface and at the end of its operation lifetime.

Tables

Generic image for table
Table I.

Surface exposure rates and underlying key parameters of the capillary AH source used for cleaning of a diameter photocathode located away from the capillary outlet. The temperature of the capillary is fixed to .

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/content/aip/journal/jap/106/5/10.1063/1.3208054
2009-09-09
2014-04-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Long term operation of high quantum efficiency GaAs(Cs,O) photocathodes using multiple recleaning by atomic hydrogen
http://aip.metastore.ingenta.com/content/aip/journal/jap/106/5/10.1063/1.3208054
10.1063/1.3208054
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