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Extending the detection limit of dopants for focused ion beam prepared semiconductor specimens examined by off-axis electron holography
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10.1063/1.3195088
/content/aip/journal/jap/106/6/10.1063/1.3195088
http://aip.metastore.ingenta.com/content/aip/journal/jap/106/6/10.1063/1.3195088
/content/aip/journal/jap/106/6/10.1063/1.3195088
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/content/aip/journal/jap/106/6/10.1063/1.3195088
2009-09-21
2014-11-29
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Extending the detection limit of dopants for focused ion beam prepared semiconductor specimens examined by off-axis electron holography
http://aip.metastore.ingenta.com/content/aip/journal/jap/106/6/10.1063/1.3195088
10.1063/1.3195088
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