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Stress determination in nickel monosilicide films using x-ray diffraction
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10.1063/1.3236626
/content/aip/journal/jap/106/7/10.1063/1.3236626
http://aip.metastore.ingenta.com/content/aip/journal/jap/106/7/10.1063/1.3236626

Figures

Image of FIG. 1.
FIG. 1.

Geometry for sample coordinate system and laboratory coordinate system .

Image of FIG. 2.
FIG. 2.

Reuss-limit x-ray elastic constant as a function of Miller indices using crystal stiffness tensor components calculated from (a) PAW, (b) US, and (c) RPAW pseudopotential methods.

Image of FIG. 3.
FIG. 3.

Measured NiSi (020)/(013) reflection vs tilt angle . The fitted normalized slope is .

Image of FIG. 4.
FIG. 4.

Measured NiSi (211)/(202) reflection vs tilt angle . The fitted normalized slope is .

Image of FIG. 5.
FIG. 5.

Measured NiSi (111)/(102) reflection vs tilt angle . The fitted normalized slope is .

Image of FIG. 6.
FIG. 6.

Comparison of in-plane stress measurements of a NiSi film using Neerfeld–Hill averaged x-ray elastic constants for single crystal stiffness components calculated using different first principles methods. The average of all three x-ray stress values is included along with the calculated stress due to thermal mismatch between NiSi and the Si substrate.

Tables

Generic image for table
Table I.

Calculated stiffness tensor components for NiSi using different simulation approaches.

Generic image for table
Table II.

Calculated compliance tensor components for NiSi using different simulation approaches. Note that the component is positive, indicating that longitudinal expansion would occur in the direction under an applied tensile load in the direction.

Generic image for table
Table III.

Calculated x-ray elastic constants for several reflections of NiSi under the Voigt, Reuss, and Neerfeld–Hill limit using the PAW pseudopotential single crystal stiffness tensor components. The constants corresponding to the combined reflections are calculated using Eq. (30).

Generic image for table
Table IV.

Calculated x-ray elastic constants for several reflections of NiSi under the Voigt, Reuss, and Neerfeld–Hill limit using the US pseudopotential single crystal stiffness tensor components. The constants corresponding to the combined reflections are calculated using Eq. (30).

Generic image for table
Table V.

Calculated x-ray elastic constants for several reflections of NiSi under the Voigt, Reuss, and Neerfeld–Hill limit using the RPAW pseudopotential single crystal stiffness tensor components. The constants corresponding to the combined reflections are calculated using Eq. (30).

Generic image for table
Table VI.

Calculated values for the thermal stress parameter , the change in in-plane film stress due to temperature, the corresponding in-plane NiSi film stress for a temperature difference of , and the mean stress averaged over the three sets of diffraction measurements. Linear elasticity is assumed for the calculated values, where the film cools from a stress-free state at approximately from to room temperature.

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/content/aip/journal/jap/106/7/10.1063/1.3236626
2009-10-14
2014-04-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Stress determination in nickel monosilicide films using x-ray diffraction
http://aip.metastore.ingenta.com/content/aip/journal/jap/106/7/10.1063/1.3236626
10.1063/1.3236626
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