XRD pattern of (a) the -thick film on (111)-oriented substrate deposited at under an oxygen pressure of and (b) the bulk target. [inset: SAD pattern of TEM along the (111) direction in the film].
HRTEM image of thick film grown on (111)-oriented substrate.
XRD profiles of the thin film with various film thickness (m: monoclinic phase, c: cubic phase).
In-plane tensile stress of films as a function of film thickness (inset: plane-view micrograph of TEM for -thick film with arrows marking a strain field).
Dielectric constant and TCC as a function of the film thickness.
Compositional analyses of the thick thin film by EPMA
Dielectric properties of monoclinic and cubic ceramics and -thick cubic thin film at .
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