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Magnetic configuration of submicron-sized magnetic patterns in domain wall motion memory
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10.1063/1.3427555
/content/aip/journal/jap/107/10/10.1063/1.3427555
http://aip.metastore.ingenta.com/content/aip/journal/jap/107/10/10.1063/1.3427555
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(a) Schematic images of U-shaped DW Seesaw pattern, (b) estimated magnetization configuration after applying external magnetic field, (c) DW Seesaw memory-cell structure. (d) operation of DW Seesaw memory cell with U-shaped pattern.

Image of FIG. 2.
FIG. 2.

Schematic images and sizes of (a) U-shaped pattern with long MF region (long U-shaped pattern) and (b) H-shaped pattern.

Image of FIG. 3.
FIG. 3.

XMCD-PEEM images and estimated magnetic configuration of U-shaped patterns. Patterns with the line widths of (a) , (b) , and (c) .

Image of FIG. 4.
FIG. 4.

(a) XMCD-PEEM image and (b) simulated magnetization configuration of U-shaped magnetic pattern.

Image of FIG. 5.
FIG. 5.

XMCD-PEEM images before and after applying the magnetic field antiparallel to the initial magnetization direction in DWM region: (a) before applying field, and after applying (b) 0.8 kA/m, (c) 1.2 kA/m, (d) 1.6 kA/m, (e) 2.4 kA/m, and (f) 3.2 kA/m.

Image of FIG. 6.
FIG. 6.

Normalized numbers of U-shaped patterns with changed magnetic configuration as function of external magnetic field. Circles are experimental data and dashed line is sigmoid fit of experimental data.

Image of FIG. 7.
FIG. 7.

XMCD-PEEM images of U-shaped magnetic patterns (a) with initial magnetization configuration, and after applying magnetic field of (b) 3.2 kA/m antiparallel to initial magnetization direction in DWM region and (c) 4.0 kA/m against direction in (b). (d) Schematic magnetic configurations formed before and after applying magnetic field; (1) DWM from right to left corners of patterns, (2) magnetization aligned in one direction and having closed structure in patterns, (3) formation of DW at center of DWM region, and (4) unchanged magnetic configuration. Gray area indicates reversed-magnetization region.

Image of FIG. 8.
FIG. 8.

Simulated magnetic configurations and their motion by applying magnetic field of U-shaped patterns. (a)–(c) Magnetic configuration after applying magnetic field at 30° tilt in anticlockwise direction to MF region (initial, left column), after applying magnetic field of (a) 5.6 kA/m, (b) 6.4 kA/m, and (c) 7.2 kA/m from antiparallel direction to magnetization in DWM region (center column), and after removing magnetic field (right column). (d)–(f) Magnetic configurations at 30° tilt in anticlockwise direction to MF region (initial, left column), after applying 8.0 kA/m from clockwise rotation (d) 15°, (e) 0°, and (f) −15° from antiparallel direction to magnetization in DWM region (center column), and after removing magnetic field (right column).

Image of FIG. 9.
FIG. 9.

XMCD-PEEM images of (a) low magnification and (b) high magnification with magnetic configuration of long U-shaped magnetic patterns after DW formation.

Image of FIG. 10.
FIG. 10.

XMCD-PEEM images for long U-shaped patterns after applying magnetic field of (a) 1.6 kA/m antiparallel to initial magnetization direction in DWM region, and after applying magnetic fields of (b) 0.8 kA/m, (c) 1.2 kA/m, (d) 1.6 kA/m, (e) 2.4 kA/m, and (f) 3.2 kA/m against direction in (a).

Image of FIG. 11.
FIG. 11.

High magnification XMCD-PEEM images for long U-shaped magnetic patterns after applying magnetic field of (a) 1.6 kA/m antiparallel to initial magnetization direction in DWM region and (b) 2.4 kA/m against direction in (a).

Image of FIG. 12.
FIG. 12.

XMCD-PEEM images of (a) low magnification and (b) high magnification with magnetic configuration for H-shaped magnetic patterns after DW formation.

Image of FIG. 13.
FIG. 13.

XMCD-PEEM images after applying magnetic field antiparallel to initial magnetization direction in DWM region. Applied fields: (a) 2.4 kA/m, (b) 3.2 kA/m, (c) 4.0 kA/m, (d) 4.8 kA/m, (e) 5.6 kA/m, and (f) 6.4 kA/m.

Image of FIG. 14.
FIG. 14.

Normalized numbers of H-shaped patterns with changed magnetic configuration as function of external magnetic field. Circles are experimental data and dashed line is sigmoid fit of experimental data.

Image of FIG. 15.
FIG. 15.

XMCD-PEEM images of H-shaped patterns: (a) initial magnetization configuration, and after application of magnetic field of (b) 6.4 kA/m antiparallel to initial magnetization direction in DWM region, and (c) 8.0 kA/m against direction in (b).

Image of FIG. 16.
FIG. 16.

High magnification XMCD-PEEM images for H-shaped magnetic patterns with unchanged patterns and their schematic magnetic configurations.

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/content/aip/journal/jap/107/10/10.1063/1.3427555
2010-05-21
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Magnetic configuration of submicron-sized magnetic patterns in domain wall motion memory
http://aip.metastore.ingenta.com/content/aip/journal/jap/107/10/10.1063/1.3427555
10.1063/1.3427555
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