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Influence of the substrate stiffness on the crystallization process of sputtered thin films
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10.1063/1.3410934
/content/aip/journal/jap/107/11/10.1063/1.3410934
http://aip.metastore.ingenta.com/content/aip/journal/jap/107/11/10.1063/1.3410934
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(a) Hysteresis loops for films before annealing (open symbols) and after annealing (solid symbols), directly deposited on different substrates: glass (circles), Si(100) (squares), mica (triangles), and kapton (stars). (b) Hysteresis loops for films before (open symbols) and after annealing (solid symbols) grown on Si(100) substrates on different buffer layers: Mo (circles), Al (squares), Pt (triangles), and Cu (stars). Curves are vertically shifted for clarity.

Image of FIG. 2.
FIG. 2.

(a) diffraction scans of as-deposited layers directly deposited on different substrates. (b) diffraction scans of annealed layers directly deposited on different substrates. Peaks related to the mica substrate are labeled with an asterisk . (c) diffraction scans of as-deposited layers deposited on different buffer layers: Cu, Mo, Pt, and Al. (d) diffraction scans of annealed layers deposited on different buffer layers: Cu, Mo, Pt, and Al. Peaks related to the phase are labeled with a T. In all cases, curves are shifted for clarity.

Image of FIG. 3.
FIG. 3.

(a) Hysteresis loops of annealed films grown on Si(100) substrates on different buffer layers: Pt/Mo (●) and Pt (○). (b) Transversal magnetostriction of the same samples. The applied magnetic field is perpendicular to the sample axis.

Image of FIG. 4.
FIG. 4.

(a) Bar diagrams showing the coercivity of annealed films deposited on different substrates and with a Mo buffer layer. (b) Transversal magnetostriction measured with the applied magnetic field perpendicular to the sample axis. In the horizontal axis, the number between brackets for each substrate is the factor . Note that Si substrate is not present as the magnetostriction cannot be measured properly in such a thick hard substrate. The values for all the materials are: ; ; ; ; ; ; ; and .

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/content/aip/journal/jap/107/11/10.1063/1.3410934
2010-06-08
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Influence of the substrate stiffness on the crystallization process of sputtered TbFe2 thin films
http://aip.metastore.ingenta.com/content/aip/journal/jap/107/11/10.1063/1.3410934
10.1063/1.3410934
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