Scanning electron micrograph of Si powder particle contamination during film deposition.
Top view of the experimental arrangement. Silane depletion fraction was measured by FTIR absorption spectroscopy in the exhaust pipe of the deposition reactor and light scattering was conducted using a 488 nm beam injected through the pumping pipe into the reactor. The scattered light was then collected from a view port orthogonally to the incident beam.
Schematic view of the light scattering optical setup.
(a) Emission spectrum of a discharge, (b) typical view from the lateral view port, (c) acquisition during plasma, and (d) acquisition 20 ms after plasma extinction.
Branching ratio for silane utilization. Silane can be either pumped, deposited, or transformed into powder.
Effect of the pressure on the silane utilization branching ratio for a 25 mm interelectrode distance. The gray bars represent the fraction of transformed into powder.
Scattering experiments as a function of pressure for . (a) Light scattering after plasma extinction and (b) plasma emission at 488 nm. Note that gray scale is different for the two columns.
Light scattering experiments for (left), 15 and 10 (right) mm for pressures between 1.5 (top) and 7 (bottom) mbars.
Integrated scattered intensity across the interelectrode gap for various as a function of the product .
density calculated from the model presented in Ref. 28 as a function of the pressure for the three interelectrode distances considered.
Effect of the input rf power on silane utilization (deposition rate on left axis and dissociation efficiency on right axis) for (left hand side series) and 25 mm (right hand side series). The gray bars represent the fraction transformed into powder.
Light scattered intensity profiles across a 25 mm gap for different pressures.
Particle agglomeration in the after-glow region for the three interelectrode distances considered.
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