(a) Schematic of the fabrication steps for the hybrid structure. (b) AFM image of the etched BARC nanostripes with the resist layer removed. (c) SEM image for 60-nm-thick Co NW arrays.
(a) The room temperature loops for 60-nm-thick Py film and single layer 60-nm-thick Co NW array. (b) Representative temperature-dependent loops for the hybrid trilayer structure [Co (60 nm NWs)/Cu (5 nm)/Py (60 nm film)], with fields applied along the longer axis of the NW.
Representative temperature-dependent MR response for the [Co (60 nm NWs)/Cu (5 nm)/Py (60 nm film)] hybrid structure with current and field applied parallel to the long axis of the NWs. –◯– correspond to field being swept from positive to negative saturation, while –●– correspond to field being swept from negative to positive saturation. The inset depicts the pictorial representation of the wire and the direction of the applied field and current with respect to the wire axis. The pads along the wires correspond to voltage and current contacts.
(a) Switching fields for the 60-nm-thick Py layer and 60-nm-thick Co NWs in the hybrid trilayer structure. (b) Extracted exchange bias field for the Co NWs in the trilayer structure for various temperatures.
Representative loops for fields applied along the longer NW direction for the [Co (60 nm NWs)/Cu ( nm)/ (60 nm film)] hybrid as a function of the Cu spacer layer thickness.
The representative MR curves for the hybrid structure with [Co (60 nm NWs)/Cu ( nm)/ (60 nm film)], with current applied transverse to the field and NW axis as a function of the Cu spacer layer thickness for .
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