Experimental setup for a combined NSMM and transport measurement system.
[(a) and (c)] 2D maps of on YBCO samples Y1 and Y2 with a manually scratched defect and lithographically fabricated COD, respectively. The dashed rectangle depicts actual location of defect while the dashed horizontal line shows the approximate location of line scan of microwave reflected power in (b) and (d). Illustrations of what the cross section of each defect may possibly look like are shown as insets.
(a) Induced voltage as function of the input microwave power on Y3 and Y4 using probe tip T1. (b) Curves normalized to bias current density.
Comparison of microwave images and line scans using, respectively, NSMM probe tips T5 and T4. (a) SEM image of a Cu tip (T5) and the corresponding (b) 2D and (c) 1D reflected microwave power scans of a TEM grid showing a step resolution of . (d) SEM image of an W tip (T4) and the corresponding (e) 2D and (f) 1D reflected microwave power scans of the same TEM grid. Submicron step resolution of was achieved.
Comparison of the induced voltage normalized to bias current density using probe tip T5 tuned to the fundamental resonant frequency and probe tip T4 tuned to the second harmonic frequency on samples (a) Y3 and (b) Y4, respectively.
Summary of the metallic NSMM tips used in this experiment.
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