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Growth, structure, and mechanical properties of hydrogenated amorphous carbon nitride films deposited by dielectric barrier discharges
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10.1063/1.3332115
/content/aip/journal/jap/107/6/10.1063/1.3332115
http://aip.metastore.ingenta.com/content/aip/journal/jap/107/6/10.1063/1.3332115
/content/aip/journal/jap/107/6/10.1063/1.3332115
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/content/aip/journal/jap/107/6/10.1063/1.3332115
2010-03-29
2014-10-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Growth, structure, and mechanical properties of hydrogenated amorphous carbon nitride films deposited by CH3CN dielectric barrier discharges
http://aip.metastore.ingenta.com/content/aip/journal/jap/107/6/10.1063/1.3332115
10.1063/1.3332115
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