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Relationship between hydrogen content and magnetic properties of diamondlike carbon produced by the rf plasma-enhanced chemical vapor deposition method
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10.1063/1.3359711
/content/aip/journal/jap/107/7/10.1063/1.3359711
http://aip.metastore.ingenta.com/content/aip/journal/jap/107/7/10.1063/1.3359711

Figures

Image of FIG. 1.
FIG. 1.

Magnetization curves of DLC films prepared by rf plasma-enhanced CVD using (a) 500 W and (b) 900 W rf power.

Image of FIG. 2.
FIG. 2.

ESR spectra of DLC films prepared by rf plasma-enhanced CVD using (a) 500 W and (b) 900 W rf power.

Image of FIG. 3.
FIG. 3.

Raman spectra of DLC films prepared by rf plasma-enhanced CVD using (a) 500 W and (b) 900 W rf power.

Image of FIG. 4.
FIG. 4.

Raw ERDA spectra of DLC films prepared by rf plasma-enhanced CVD using (a) 500 W and (b) 900 W rf power. The raw ERDA spectrum of a standard silicon specimen prepared by H ion implantation (c) is also shown for comparison.

Image of FIG. 5.
FIG. 5.

Damage-corrected ERDA spectra of DLC films prepared by rf plasma-enhanced CVD using (a) 500 W and (b) 900 W rf power.

Tables

Generic image for table
Table I.

Spin density of DLC films calculated from ESR spectra.

Generic image for table
Table II.

Ratio of and G position of DLC films prepared by rf plasma-enhanced CVD.

Generic image for table
Table III.

Density and hydrogen content of DLC films calculated from ERDA measurements.

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/content/aip/journal/jap/107/7/10.1063/1.3359711
2010-04-14
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Relationship between hydrogen content and magnetic properties of diamondlike carbon produced by the rf plasma-enhanced chemical vapor deposition method
http://aip.metastore.ingenta.com/content/aip/journal/jap/107/7/10.1063/1.3359711
10.1063/1.3359711
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