Stress in the a-Si films as a function of the deposition temperature.
Optical micrograph of the surface of a-Si films onset of cracking.
The theoretical and experimental critical thicknesses for crack formation as a function of a-Si film stress.
Stress in the a-Si:H films as a function of dilution ratio .
The theoretical and experimental critical thicknesses for film delamination as a function of a-Si:H film stress.
Physical properties of a-Si and a-Si:H.
Article metrics loading...
Full text loading...