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Investigation on critical failure thickness of hydrogenated/nonhydrogenated amorphous silicon films
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10.1063/1.3369254
/content/aip/journal/jap/107/7/10.1063/1.3369254
http://aip.metastore.ingenta.com/content/aip/journal/jap/107/7/10.1063/1.3369254

Figures

Image of FIG. 1.
FIG. 1.

Stress in the a-Si films as a function of the deposition temperature.

Image of FIG. 2.
FIG. 2.

Optical micrograph of the surface of a-Si films onset of cracking.

Image of FIG. 3.
FIG. 3.

The theoretical and experimental critical thicknesses for crack formation as a function of a-Si film stress.

Image of FIG. 4.
FIG. 4.

Stress in the a-Si:H films as a function of dilution ratio .

Image of FIG. 5.
FIG. 5.

The theoretical and experimental critical thicknesses for film delamination as a function of a-Si:H film stress.

Tables

Generic image for table
Table I.

Physical properties of a-Si and a-Si:H.

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/content/aip/journal/jap/107/7/10.1063/1.3369254
2010-04-07
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Investigation on critical failure thickness of hydrogenated/nonhydrogenated amorphous silicon films
http://aip.metastore.ingenta.com/content/aip/journal/jap/107/7/10.1063/1.3369254
10.1063/1.3369254
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