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Silicon nanowire polarizers for far ultraviolet (sub-200 nm) applications: Modeling and fabrication
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10.1063/1.3354099
/content/aip/journal/jap/107/8/10.1063/1.3354099
http://aip.metastore.ingenta.com/content/aip/journal/jap/107/8/10.1063/1.3354099
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

WGP fabrication and modeling. (a) Diblock copolymer (circles: PS cylinders in PHMA matrix) atop amorphous Si layer on fused-silica substrate, where copolymer has periodicity and cylinder diameter . (b) Postetched system with amorphous Si wires atop fused-silica substrate. (c) Structure utilized in numerical model, where wires are idealized to possess a rectangular profile.

Image of FIG. 2.
FIG. 2.

Comparison of polarization efficiencies of two devices, one (Ref. 4) fabricated from PS/PHMA 22/63 (, solid line) and one from PS/PHMA 47/145 (, dashed line). Polystyrene volume fraction for both polymers.

Image of FIG. 3.
FIG. 3.

Refractive index () and extinction (absorption) coefficients () of α-Si for fabricated sample, as compared to literature values.12 For clarity every 5th data point is plotted for the Palik data and every 50th data point is plotted for our experimental data. See Table I in the supplementary material at Ref. 10 for a comprehensive table of values and Fig. 8 in Ref. 10 for a corresponding graphical presentation.

Image of FIG. 4.
FIG. 4.

Representative model predictions showing the effect of varying (a) (, ), (b) (, ), and (c) (, ). Panel (a) also includes a prediction for the small- limit.

Image of FIG. 5.
FIG. 5.

Summary plot showing the trend of polarization efficiency at vs both and for ; lines are best-fit curves. ◼ , ● , ▲ , ▼ , , , ◆ , and . derived from relationship which is defined by the experimental etch rate ratios and Eq. (3).

Image of FIG. 6.
FIG. 6.

Experimental system fabricated from 47/145 PS/PHMA (dotted line) vs model prediction (solid line) with parameters , , and .

Image of FIG. 7.
FIG. 7.

(a) AFM phase image: block copolymer, postshear, prestaining indicating long-range alignment of PS cylinders (white in image) in PHMA matrix; (b) AFM amplitude image: block copolymer, postshear, poststaining, indicating the wiggle introduced by buckling of the PS cylinders in the staining process; and (c) SEM image: finished WGP, showing projection of wiggle from mask into final wires. All images ; scale bar in (c) is .

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/content/aip/journal/jap/107/8/10.1063/1.3354099
2010-04-22
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Silicon nanowire polarizers for far ultraviolet (sub-200 nm) applications: Modeling and fabrication
http://aip.metastore.ingenta.com/content/aip/journal/jap/107/8/10.1063/1.3354099
10.1063/1.3354099
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