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Enhancing exposure depth for surface-plasmon polaritons interference nanolithography by waveguide modulation
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10.1063/1.3330697
/content/aip/journal/jap/108/1/10.1063/1.3330697
http://aip.metastore.ingenta.com/content/aip/journal/jap/108/1/10.1063/1.3330697
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Schematic configuration of WM-SPPIL, the device is composed of a prism with a rectangle aperture , metal film , resist , and substrate. The thicknesses of waveguide and metal film are and , respectively, and is the incident angle.

Image of FIG. 2.
FIG. 2.

Simulated interference patterns by FDTD with different (Constants , ), (a) and (b) comparing with (c) the result of conventional SPPIL.

Image of FIG. 3.
FIG. 3.

Amplitude and contrast distributions with different (Constants , ), [(a), (c)] and [(b), (d)] .

Image of FIG. 4.
FIG. 4.

Maximum exposure depth of interference pattern vs (a) (Constants , ), (b) (Constants , ), and (c) (Constants , ).

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/content/aip/journal/jap/108/1/10.1063/1.3330697
2010-07-07
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Enhancing exposure depth for surface-plasmon polaritons interference nanolithography by waveguide modulation
http://aip.metastore.ingenta.com/content/aip/journal/jap/108/1/10.1063/1.3330697
10.1063/1.3330697
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