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Roughening of porous SiCOH materials in fluorocarbon plasmas
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10.1063/1.3446820
/content/aip/journal/jap/108/1/10.1063/1.3446820
http://aip.metastore.ingenta.com/content/aip/journal/jap/108/1/10.1063/1.3446820

Figures

Image of FIG. 1.
FIG. 1.

Standard deviation as a function of the RMS roughness measured with four different samples.

Image of FIG. 2.
FIG. 2.

Determination of the correlation length by taking from the log-log PSD graph the intersection between the PSD saturation line and the high frequency line.

Image of FIG. 3.
FIG. 3.

RMS roughness (a) and correlation length (b) as a function of the etched depth of porous SiCOH (25%) using a plasma.

Image of FIG. 4.
FIG. 4.

Tilted SEM pictures, AFM top down pictures, and AFM cross sections for different porous SiCOH (25%) etched depths in a plasma.

Image of FIG. 5.
FIG. 5.

RMS roughness as a function of the etched depth for porous SiCOH (25%), porous SiCOH (28%), and dense SiCOH using a plasma.

Image of FIG. 6.
FIG. 6.

RMS roughness as a function of the etched depth for porous SiCOH (25%) using a , a , or a pure Ar plasma.

Image of FIG. 7.
FIG. 7.

Tilted (30°) SEM pictures of porous SiCOH (a) and dense SiCOH (b) etched in a plasma.

Image of FIG. 8.
FIG. 8.

Surface morphology after plasma exposure: (a) on porous SiCOH (25%), (b) on porous SiCOH (25%), (c) on porous SiCOH (25%), and (d) on dense SiCOH.

Image of FIG. 9.
FIG. 9.

Surface morphology before (a) and after (b) Ar plasma exposure of porous SiCOH (25%).

Image of FIG. 10.
FIG. 10.

RMS roughness (a) and correlation length (b) evolution during the etching in plasma of a stack made of 330 nm of porous SiCOH (25%) on a dense SiCOH material.

Image of FIG. 11.
FIG. 11.

Tilted SEM picture of porous SiCOH (25%) etched using a plasma in a environment (a) or a TiN environment (b).

Tables

Generic image for table
Table I.

Characteristics of the dielectric materials.

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/content/aip/journal/jap/108/1/10.1063/1.3446820
2010-07-09
2014-04-16
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Roughening of porous SiCOH materials in fluorocarbon plasmas
http://aip.metastore.ingenta.com/content/aip/journal/jap/108/1/10.1063/1.3446820
10.1063/1.3446820
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