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Moving interface hydride formation in multilayered metal thin films
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10.1063/1.3447868
/content/aip/journal/jap/108/1/10.1063/1.3447868
http://aip.metastore.ingenta.com/content/aip/journal/jap/108/1/10.1063/1.3447868
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(110) XRD peak area (points) as a function of time during in situ measurement under an atmosphere. The line represents a fit to the model function of Eq. (8).

Image of FIG. 2.
FIG. 2.

Mg (002) XRD peak area (points) as a function of time during in situ measurement under an atmosphere. The line represents a fit to the model function of Eq. (8).

Image of FIG. 3.
FIG. 3.

The chemical potential profile through the model system.

Image of FIG. 4.
FIG. 4.

Linear cutoff function to scale the model derivative.

Image of FIG. 5.
FIG. 5.

Example plots of the model represented by Eq. (7) (dotted line) along with the model including the cutoff function as given by Eq. (8) (solid line).

Image of FIG. 6.
FIG. 6.

In situ XRD data showing the Mg (002) peak area as a function of time for 2000, 4000, and 8000 Å thick Mg films.

Image of FIG. 7.
FIG. 7.

In situ XRD data showing the (110) peak area as a function of time for 2000, 4000, and 8000 Å thick Mg films.

Image of FIG. 8.
FIG. 8.

Log-log plot of the Mg (002) peak area data for the 2000 and 4000 Å thick Mg films shown in Fig. 6. Dotted lines indicate the linear and regimes. Deviation from the linear regime occurs for reacted thicknesses greater than .

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/content/aip/journal/jap/108/1/10.1063/1.3447868
2010-07-13
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Moving interface hydride formation in multilayered metal thin films
http://aip.metastore.ingenta.com/content/aip/journal/jap/108/1/10.1063/1.3447868
10.1063/1.3447868
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