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From amorphous to microcrystalline: Phase transition in rapid synthesis of hydrogenated silicon thin film in low frequency inductively coupled plasmas
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10.1063/1.3514006
/content/aip/journal/jap/108/11/10.1063/1.3514006
http://aip.metastore.ingenta.com/content/aip/journal/jap/108/11/10.1063/1.3514006
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Schematic diagram of the ICP system.

Image of FIG. 2.
FIG. 2.

(a) Raman spectra of the films deposited at varied inductive rf power density. (b) Schematic fitting for the decomposition of Raman scattering spectra. (c) Raman crystalline fraction and deposition rate as functions of the inductive rf power density.

Image of FIG. 3.
FIG. 3.

XRD patterns of the Si:H films deposited at different inductive rf power densities.

Image of FIG. 4.
FIG. 4.

A typical plain view (a) and the corresponding cross-section view (b) of the film deposited at an inductive rf power density of . (c) The surface morphology of the film with an intermediate phase between microcrystalline and a-Si deposited at a power density of . (d) The surface morphology of the a-Si:H film deposited at a power density of .

Image of FIG. 5.
FIG. 5.

QMS spectra for (a) basic vacuum chamber and (b) the discharge at an inductively coupled power density of . The internal ionizer of the QMS was turned off when the ICP chamber was being discharging.

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/content/aip/journal/jap/108/11/10.1063/1.3514006
2010-12-09
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: From amorphous to microcrystalline: Phase transition in rapid synthesis of hydrogenated silicon thin film in low frequency inductively coupled plasmas
http://aip.metastore.ingenta.com/content/aip/journal/jap/108/11/10.1063/1.3514006
10.1063/1.3514006
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