XRD patterns of PZTN films deposited on (a) 34 nm, (b) 68 nm, (c) 135 nm, (d) 270 nm thick BPO.
(a) Standard silicon powder diffraction, (b) instrumental FWHM curve, (c) Williamson–Hall plot for PZTN-135.
(a) Mean grain size, (b) microstrain, and (c) residual stress changed with BPO thickness.
AFM 3D images for (a) PZTN-34, (b) PZTN-68, (c) PZTN0135, (d) PZTN-270.
(a) Change in XRD pattern of PZTN-135 films as a function of angle, (b) Change in peak position of PZTN-135 as a function of .
The P-E loops of PZTN films with the various thickness of BPO bottom electrodes.
The remanent polarization (a) and coercive field (b) as a function of driving electric fields.
Fatigue behavior of PZTN films with various thickness of BPO electrodes.
Dielectric constant (a) and dielectric loss (b) of PZTN films in dependence of BPO thickness.
Grazing XRD scan of pseudocubic (200)/(220) and (022)/(220) reflections for PZTN-68 and PZTN-135.
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