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Stress analysis and ferroelectric properties of thin film grown on different thickness of electrodes
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View: Figures


Image of FIG. 1.
FIG. 1.

XRD patterns of PZTN films deposited on (a) 34 nm, (b) 68 nm, (c) 135 nm, (d) 270 nm thick BPO.

Image of FIG. 2.
FIG. 2.

(a) Standard silicon powder diffraction, (b) instrumental FWHM curve, (c) Williamson–Hall plot for PZTN-135.

Image of FIG. 3.
FIG. 3.

(a) Mean grain size, (b) microstrain, and (c) residual stress changed with BPO thickness.

Image of FIG. 4.
FIG. 4.

AFM 3D images for (a) PZTN-34, (b) PZTN-68, (c) PZTN0135, (d) PZTN-270.

Image of FIG. 5.
FIG. 5.

(a) Change in XRD pattern of PZTN-135 films as a function of angle, (b) Change in peak position of PZTN-135 as a function of .

Image of FIG. 6.
FIG. 6.

The P-E loops of PZTN films with the various thickness of BPO bottom electrodes.

Image of FIG. 7.
FIG. 7.

The remanent polarization (a) and coercive field (b) as a function of driving electric fields.

Image of FIG. 8.
FIG. 8.

Fatigue behavior of PZTN films with various thickness of BPO electrodes.

Image of FIG. 9.
FIG. 9.

Dielectric constant (a) and dielectric loss (b) of PZTN films in dependence of BPO thickness.

Image of FIG. 10.
FIG. 10.

Grazing XRD scan of pseudocubic (200)/(220) and (022)/(220) reflections for PZTN-68 and PZTN-135.


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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Stress analysis and ferroelectric properties of Pb(Zr0.52Ti0.48)0.96Nb0.04O3 thin film grown on different thickness of BaPbO3 electrodes