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Comparative time-resolved study of the etching of Mo and Si
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10.1063/1.3520653
/content/aip/journal/jap/108/11/10.1063/1.3520653
http://aip.metastore.ingenta.com/content/aip/journal/jap/108/11/10.1063/1.3520653
/content/aip/journal/jap/108/11/10.1063/1.3520653
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/content/aip/journal/jap/108/11/10.1063/1.3520653
2010-12-13
2014-08-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Comparative time-resolved study of the XeF2 etching of Mo and Si
http://aip.metastore.ingenta.com/content/aip/journal/jap/108/11/10.1063/1.3520653
10.1063/1.3520653
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