1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Influence of krypton atoms on the structure of hydrogenated amorphous carbon deposited by plasma enhanced chemical vapor deposition
Rent:
Rent this article for
USD
10.1063/1.3526000
/content/aip/journal/jap/108/12/10.1063/1.3526000
http://aip.metastore.ingenta.com/content/aip/journal/jap/108/12/10.1063/1.3526000
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Concentration of Kr atoms incorporated into a-C:H films deposited by PECVD as a function of the (a) bias voltage and (b) Kr partial pressure.

Image of FIG. 2.
FIG. 2.

Raman spectra obtained from Kr free samples deposited with different self-bias voltages with excitation radiation in the visible (a) and in the UV range (b).

Image of FIG. 3.
FIG. 3.

Parameters extracted from visible and UV Raman: (a) I(d)/I(g), (b) G peak position (c) G peak FWHM and (d) G peak dispersion, as a function of deposition bias voltage of Kr free and Kr incorporated a-C:H films.

Image of FIG. 4.
FIG. 4.

Parameters extracted from visible and UV Raman: (a) I(d)/I(g), (b) G peak position and (c) G peak FWHM and (d) G peak dispersion, as a function of Kr partial pressure

Image of FIG. 5.
FIG. 5.

Carbon–hydrogen stretching vibrational mode for Kr free (a) and Kr incorporated a-C:H films deposited by PECVD, as a function of the bias voltage.

Image of FIG. 6.
FIG. 6.

Carbon–hydrogen stretching vibrational mode of films deposited with different CH4/Kr atmosphere compositions.

Image of FIG. 7.
FIG. 7.

Hydrogen content of a-C:H films, deposited with and without krypton in the atmosphere, estimated from FTIR data using the approximation proposed by Ristein et al. (Ref. 41) for films deposited as function of the bias voltages (a) and Kr partial pressure (b).

Image of FIG. 8.
FIG. 8.

Comparison between the dependence of the optical gap on the bias voltage for Kr free and Kr incorporated a-C:H films (a) and on the Kr partial pressure (b).

Image of FIG. 9.
FIG. 9.

(a) Compressive stress as a function of the bias voltage for Kr free and Kr incorporated a-C:H films. (b) Compressive stress of a-C:H as a function of Kr partial pressure in the deposition atmosphere.

Loading

Article metrics loading...

/content/aip/journal/jap/108/12/10.1063/1.3526000
2010-12-30
2014-04-24
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Influence of krypton atoms on the structure of hydrogenated amorphous carbon deposited by plasma enhanced chemical vapor deposition
http://aip.metastore.ingenta.com/content/aip/journal/jap/108/12/10.1063/1.3526000
10.1063/1.3526000
SEARCH_EXPAND_ITEM