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Maskless fabrication of large scale Si nanohole array via laser annealed metal nanoparticles catalytic etching for photovoltaic application
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10.1063/1.3462397
/content/aip/journal/jap/108/2/10.1063/1.3462397
http://aip.metastore.ingenta.com/content/aip/journal/jap/108/2/10.1063/1.3462397
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Schematic of the nanohole structure fabrication process.

Image of FIG. 2.
FIG. 2.

SEM images of laser annealed silver films with different thickness (a) 50 nm, (b) 25 nm, and (c) 8 nm.

Image of FIG. 3.
FIG. 3.

(a) SEM image of laser annealed silver film with energy density, (b) corresponding silver nanoparticle diameter histogram, and (c) average diameter as a function of laser energy density.

Image of FIG. 4.
FIG. 4.

SEM images of silver film receives (a) plane-view and (b) cross-sectional view of the nanohole structure after chemical etch.

Image of FIG. 5.
FIG. 5.

Transmission, reflection, and absorption spectra of (a) nanohole textured silicon wafer and (b) blank wafer.

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/content/aip/journal/jap/108/2/10.1063/1.3462397
2010-07-16
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Maskless fabrication of large scale Si nanohole array via laser annealed metal nanoparticles catalytic etching for photovoltaic application
http://aip.metastore.ingenta.com/content/aip/journal/jap/108/2/10.1063/1.3462397
10.1063/1.3462397
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