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Investigation of the roles of gas-phase molecules and F atoms during fluorocarbon plasma processing of Si and substrates
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10.1063/1.3467776
/content/aip/journal/jap/108/3/10.1063/1.3467776
http://aip.metastore.ingenta.com/content/aip/journal/jap/108/3/10.1063/1.3467776
/content/aip/journal/jap/108/3/10.1063/1.3467776
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/content/aip/journal/jap/108/3/10.1063/1.3467776
2010-08-05
2014-11-26
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Investigation of the roles of gas-phase CF2 molecules and F atoms during fluorocarbon plasma processing of Si and ZrO2 substrates
http://aip.metastore.ingenta.com/content/aip/journal/jap/108/3/10.1063/1.3467776
10.1063/1.3467776
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