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Two dimensional electron gases in polycrystalline MgZnO/ZnO heterostructures grown by rf-sputtering process
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10.1063/1.3475500
/content/aip/journal/jap/108/5/10.1063/1.3475500
http://aip.metastore.ingenta.com/content/aip/journal/jap/108/5/10.1063/1.3475500
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

XRD pattern of rf-sputtered ZnO layer before and after post-deposition annealing.

Image of FIG. 2.
FIG. 2.

Sheet resistance of polycrystalline heterostructure vs thickness of cap layer for , 0.2, 0.3, 0.4, and 0.5. The lines are guides to the eyes.

Image of FIG. 3.
FIG. 3.

(a) Hall mobility and sheet carrier concentration of heterostructure in saturation as functions of Mg content x. (b) Comparison of experimental and calculated saturation sheet resistances as functions of Mg content x. The lines are guides to the eye.

Image of FIG. 4.
FIG. 4.

Hall mobility and carrier concentration of heterostructure with capping layer thickness of as functions of temperature.

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/content/aip/journal/jap/108/5/10.1063/1.3475500
2010-09-07
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Two dimensional electron gases in polycrystalline MgZnO/ZnO heterostructures grown by rf-sputtering process
http://aip.metastore.ingenta.com/content/aip/journal/jap/108/5/10.1063/1.3475500
10.1063/1.3475500
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