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Increased low field magnetoresistance in electron doped system
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10.1063/1.3481085
/content/aip/journal/jap/108/5/10.1063/1.3481085
http://aip.metastore.ingenta.com/content/aip/journal/jap/108/5/10.1063/1.3481085

Figures

Image of FIG. 1.
FIG. 1.

Rietveld fitting for compound and 0.4. The symbol “*” shows the impurity phase .

Image of FIG. 2.
FIG. 2.

Magnetization vs applied magnetic field plots for all the samples. Inset shows the magnetization vs temperature plots for the samples.

Image of FIG. 3.
FIG. 3.

(a) MR values of the samples at 80 K. (b) MR values of the samples at 300 K.

Image of FIG. 4.
FIG. 4.

[(a)–(f)] SEM images for the samples . The SEM image of sample at two different places is shown.

Image of FIG. 5.
FIG. 5.

MR (H)/MR (0.64 T) vs applied field and vs applied field plots for samples. Both MR (H)/MR (0.64 T) and are shown at same Y axis.

Tables

Generic image for table
Table I.

Different properties of the sample .

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/content/aip/journal/jap/108/5/10.1063/1.3481085
2010-09-13
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Increased low field magnetoresistance in electron doped system Sr0.4Ba1.6−xLaxFeMoO6
http://aip.metastore.ingenta.com/content/aip/journal/jap/108/5/10.1063/1.3481085
10.1063/1.3481085
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