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Mechanisms of high quality thin films deposition at low temperature by vapor cooling condensation technique
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10.1063/1.3477325
/content/aip/journal/jap/108/7/10.1063/1.3477325
http://aip.metastore.ingenta.com/content/aip/journal/jap/108/7/10.1063/1.3477325
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Setup of vapor cooling condensation system.

Image of FIG. 2.
FIG. 2.

XRD patterns of HT-ZnO films and LT-ZnO films deposited on Si.

Image of FIG. 3.
FIG. 3.

AFM images of (a) HT-ZnO films and (b) LT-ZnO films deposited on Si.

Image of FIG. 4.
FIG. 4.

The electron concentration and mobility of (a) HT-ZnO and (b) LT-ZnO as a function of measurement temperature.

Image of FIG. 5.
FIG. 5.

The conductivity as a function of reciprocal temperature for HT-ZnO and LT-ZnO films.

Image of FIG. 6.
FIG. 6.

The dependence of on photon energy for LT-ZnO films and HT-ZnO films.

Image of FIG. 7.
FIG. 7.

The absorption coefficient in the near band-edge regime as a function of the incident photon energy for LT-ZnO films and HT-ZnO films.

Image of FIG. 8.
FIG. 8.

Room-temperature PL spectra of HT-ZnO films and LT-ZnO films excited with a He–Cd laser with a wavelength of 325 nm.

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/content/aip/journal/jap/108/7/10.1063/1.3477325
2010-10-14
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Mechanisms of high quality i-ZnO thin films deposition at low temperature by vapor cooling condensation technique
http://aip.metastore.ingenta.com/content/aip/journal/jap/108/7/10.1063/1.3477325
10.1063/1.3477325
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