XRD patterns of the thin layers grown with oxygen partial pressures: (a) 0.05 Pa, (b) 0.08 Pa, (c) 0.10 Pa, and (d) 0.13 Pa.
Transmission infrared absorption spectra of magnetron sputtered CuO films (100 nm thick), using a blank Si substrate as reference. Inset: wider frequency range for the same sample.
SEM cross-section images of multilayers magnetron sputtered. A: 3 layers . B: 10 layers of CuO(100 nm)/Al(100 nm).
TEM, cross-section image of multilayers magnetron sputtered Al/CuO.
Dependence of the stress in the thin aluminum layer on bias.
Thermal analysis diagram for microstructured (gray curve) and nanostructured samples (black curve): (a) DSC and (b) DTA.
XRD pattern of C-type samples after reaction in DSC.
Multilayered Al/CuO deposition parameters.
Multilayered Al/CuO samples.
Stress measurements results.
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