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Growth and characteristics of tantalum oxide thin films deposited using thermionic vacuum arc technology
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10.1063/1.3503278
/content/aip/journal/jap/108/9/10.1063/1.3503278
http://aip.metastore.ingenta.com/content/aip/journal/jap/108/9/10.1063/1.3503278

Figures

Image of FIG. 1.
FIG. 1.

Experimental setup for thin films deposition by TVA method.

Image of FIG. 2.
FIG. 2.

Photos of the droplets on glass sample.

Image of FIG. 3.
FIG. 3.

Diagram of the SFE values obtained by Owens–Wendt method.

Image of FIG. 4.
FIG. 4.

Diagram of the SFE values (Wu equation of state method).

Image of FIG. 5.
FIG. 5.

TEM image of the film.

Image of FIG. 6.
FIG. 6.

Grain size distribution (Feret's diameter histogram).

Image of FIG. 7.
FIG. 7.

Diffraction pattern of the film.

Image of FIG. 8.
FIG. 8.

Profile from SAED image.

Tables

Generic image for table
Table I.

The parameters for thin films synthesis.

Generic image for table
Table II.

Values of contact angle on different substrates.

Generic image for table
Table III.

Results obtained for thickness and refractive index.

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/content/aip/journal/jap/108/9/10.1063/1.3503278
2010-11-01
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Growth and characteristics of tantalum oxide thin films deposited using thermionic vacuum arc technology
http://aip.metastore.ingenta.com/content/aip/journal/jap/108/9/10.1063/1.3503278
10.1063/1.3503278
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