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Growth and characteristics of tantalum oxide thin films deposited using thermionic vacuum arc technology
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10.1063/1.3503278
/content/aip/journal/jap/108/9/10.1063/1.3503278
http://aip.metastore.ingenta.com/content/aip/journal/jap/108/9/10.1063/1.3503278
/content/aip/journal/jap/108/9/10.1063/1.3503278
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/content/aip/journal/jap/108/9/10.1063/1.3503278
2010-11-01
2014-10-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Growth and characteristics of tantalum oxide thin films deposited using thermionic vacuum arc technology
http://aip.metastore.ingenta.com/content/aip/journal/jap/108/9/10.1063/1.3503278
10.1063/1.3503278
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