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Effects of patterning induced stress relaxation in strained SOI/SiGe layers and substrate
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10.1063/1.3597641
/content/aip/journal/jap/109/12/10.1063/1.3597641
http://aip.metastore.ingenta.com/content/aip/journal/jap/109/12/10.1063/1.3597641
/content/aip/journal/jap/109/12/10.1063/1.3597641
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/content/aip/journal/jap/109/12/10.1063/1.3597641
2011-06-28
2015-04-01
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effects of patterning induced stress relaxation in strained SOI/SiGe layers and substrate
http://aip.metastore.ingenta.com/content/aip/journal/jap/109/12/10.1063/1.3597641
10.1063/1.3597641
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