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Ultrananocrystalline diamond film deposition by direct-current plasma assisted chemical vapor deposition using hydrogen-rich precursor gas in the absence of the positive column
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10.1063/1.3533764
/content/aip/journal/jap/109/2/10.1063/1.3533764
http://aip.metastore.ingenta.com/content/aip/journal/jap/109/2/10.1063/1.3533764
/content/aip/journal/jap/109/2/10.1063/1.3533764
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/content/aip/journal/jap/109/2/10.1063/1.3533764
2011-01-21
2014-11-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Ultrananocrystalline diamond film deposition by direct-current plasma assisted chemical vapor deposition using hydrogen-rich precursor gas in the absence of the positive column
http://aip.metastore.ingenta.com/content/aip/journal/jap/109/2/10.1063/1.3533764
10.1063/1.3533764
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