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Growth and magnetism of low-temperature deposited Fe/Si(111) films as an intermediate layer for suppression of silicide formation
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10.1063/1.3537832
/content/aip/journal/jap/109/2/10.1063/1.3537832
http://aip.metastore.ingenta.com/content/aip/journal/jap/109/2/10.1063/1.3537832
/content/aip/journal/jap/109/2/10.1063/1.3537832
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/content/aip/journal/jap/109/2/10.1063/1.3537832
2011-01-20
2014-10-22
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Growth and magnetism of low-temperature deposited Fe/Si(111) films as an intermediate layer for suppression of silicide formation
http://aip.metastore.ingenta.com/content/aip/journal/jap/109/2/10.1063/1.3537832
10.1063/1.3537832
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