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Growth and magnetism of low-temperature deposited Fe/Si(111) films as an intermediate layer for suppression of silicide formation
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10.1063/1.3537832
/content/aip/journal/jap/109/2/10.1063/1.3537832
http://aip.metastore.ingenta.com/content/aip/journal/jap/109/2/10.1063/1.3537832
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Auger ratios of (left axis) and (right axis) measured as a function of Fe thickness. The solid circles and solid squares indicate the Fe/Si AES ratio of RT-grown Fe films and RT-Fe/5 ML LT-Fe films on Si(111), respectively. The open circles and open squares indicate the Si/Fe AES ratio of RT-Fe and RT-Fe/5 ML LT-Fe films on Si(111), respectively. The solid and dotted curves are the fitting results by Eqs. (1) and (2).

Image of FIG. 2.
FIG. 2.

Auger ratios of Si/Fe measured as a function of annealing temperature. The circles, squares, and triangle indicate the series data of 5, 15, and 25 ML LT-grown Fe/Si(111) films. The solid curves are guides for the eye.

Image of FIG. 3.
FIG. 3.

Surface morphology of (a) 24 and (b) 40 ML LT-grown Fe films, investigated by STM. The figures are all . The insets reveal the detailed surface structures. The line profiles indicated in the STM images are plotted at the bottom.

Image of FIG. 4.
FIG. 4.

Longitudinal MOKE hysteresis loops measured at RT for ML of RT-grown Fe on an intermediate layer of 5 ML LT-Fe on Si(111).

Image of FIG. 5.
FIG. 5.

Kerr saturation signal (: left-axis) and coercivity field (: right axis) plotted as function of Fe coverage. The data points were analyzed from the hysteresis loops of ML RT-Fe/5 ML LT-Fe/Si(111) in Fig. 4. The solid line and curve are the fitting results of and using a linear function and Eq. (6), respectively.

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/content/aip/journal/jap/109/2/10.1063/1.3537832
2011-01-20
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Growth and magnetism of low-temperature deposited Fe/Si(111) films as an intermediate layer for suppression of silicide formation
http://aip.metastore.ingenta.com/content/aip/journal/jap/109/2/10.1063/1.3537832
10.1063/1.3537832
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