Experimental plasma reactor 1 for studying the exposure of the low-k films to He plasma: He+ ions + VUV photons and He* metastable atoms (samples 1 2), VUV photons and He* metastable atoms (sample 3), and only He* metastable atoms (sample 4).
The calculated energy spectra of He+ ions incident on a surface of samples 1 and 2 in the SWD plasma column after normalization on the measured ion densities. He pressure −20 mTorr, the inputted rf power −23 W.
XRF data on C atom density in CVD1 and CVD3 films after the treatment in the He plasma and by O and H atoms. The data are normalized on pristine C density in CVD1.
Differential FTIR spectra of CVD1 and CVD3 films exposed to the He plasma and O and H atoms. The spectra were normalized to FTIR spectra of the pristine samples.
FTIR spectroscopy measurements of the bond densities in CVD1 and CVD3 after exposure to the He plasma and O and H atoms. The measurements are normalized to the pristine densities in CVD1 for each bond.
O atom loss probabilities on CVD1, CVD2, and CVD3 before and after the different treatments.
The ellipsometric porosimetry data for open porosity during the toluene adsorption/desorption cycle for CVD3 samples (pristine and treated in He CCP discharge): He CCP: 20 mTorr, 15 W (left), He CCP: 60 mTorr, 10 W (right).
Plasma probe measurements for samples #1 and #2 (10 and 20 cm from the electrodes). N i- ion density; T e- electron temperature; V p and V f- plasma and float potentials; f i- ion flux on the sample surface. He pressure −20 mTorr, rf power −23 W.
Properties of low-k films used in this research.
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