Schematic drawing of the sputtering targets. Al2O3 chips are placed on Fe70Co30 disk in two different ways: (a) uniformly dispersed on the sputtering area (Target-A) and (b) dispersed on half side of sputtering area (Target-B).
Permeability spectra of FeCoAlO films deposited by using: (a) Target-A and (b) Target-B.
Hysteresis loops of FeCoAlO films deposited by using: (a) Target-A and (b) Target-B.
XRD patterns of (a) Fe70Co30 film and FeCoAlO films prepared by using (b) Target-A and (c) Target-B.
Composition profile of the FeCoAlO films prepared by using Target-B.
Experimental (110) interplanar distances d 110 for the pure Fe70Co30 film and the FeCoAlO films at different positions. The insets are XRD patterns at position close to end-FeCo and end-AlO.
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