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Effect of duty ratio of patterned surface on planarization by gas cluster ion beams
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10.1063/1.3556783
/content/aip/journal/jap/109/7/10.1063/1.3556783
http://aip.metastore.ingenta.com/content/aip/journal/jap/109/7/10.1063/1.3556783
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(Color online) Schematic of experimental method.

Image of FIG. 2.
FIG. 2.

(Color online) AFM images of DLC surfaces before/after GCIB.

Image of FIG. 3.
FIG. 3.

(Color online) Pattern depth of line and spaces as a function of GCIB dose.

Image of FIG. 4.
FIG. 4.

(Color online) Reduction rate of the pattern depth of line and spaces as a function of GCIB dose.

Image of FIG. 5.
FIG. 5.

(Color online) Average roughness of the line and spaces as a function of GCIB dose.

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/content/aip/journal/jap/109/7/10.1063/1.3556783
2011-03-30
2014-04-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effect of duty ratio of patterned surface on planarization by gas cluster ion beams
http://aip.metastore.ingenta.com/content/aip/journal/jap/109/7/10.1063/1.3556783
10.1063/1.3556783
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