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Synthesis of SrTiO3 by crystallization of SrO/TiO2 superlattices prepared by atomic layer deposition
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Image of FIG. 1.
FIG. 1.

(Color online) Initial growth of TiO2 and SrO on silicon. Surface coverage determined by RBS.

Image of FIG. 2.
FIG. 2.

Cross-sectional bright field HRTEM Images of STO-2020 layers deposited on Si and Ru/TiN.

Image of FIG. 3.
FIG. 3.

(Color online) XRR thickness of as-deposited STO films on Si and Ru. Filled symbols for STO-1010 samples. The film thickness on Ru films is significantly increased.

Image of FIG. 4.
FIG. 4.

(Color online) Surface coverage of titanium (a) and strontium atoms (b) on Ru and Si substrates.

Image of FIG. 5.
FIG. 5.

(Color online) Sr/Ti atomic ratio of as deposited films on different substrates determined by RBS and ERDA.

Image of FIG. 6.
FIG. 6.

Correlation of the carbon signal to strontium signal derived by ERDA.

Image of FIG. 7.
FIG. 7.

(Color online) XPS spectra (a) Sr 3d, (b) C 1s, (c) Ti 2p, and (d) O 1s of 20:20 sample on Si.

Image of FIG. 8.
FIG. 8.

(Color online) XRR pattern of 10:10 sample on silicon, as deposited offset, annealing conditions: 650 °C N2 60 s.

Image of FIG. 9.
FIG. 9.

(Color online) HT-GIXRD of 20:20 sample on ruthenium electrodes.

Image of FIG. 10.
FIG. 10.

GIXRD diffractogram recorded after high-temperature GIXRD, cubic STO peaks as well as rutile TiO2 peaks are visible.

Image of FIG. 11.
FIG. 11.

(Color online) TEM images of 10:10 samples (a) after rapid thermal annealing (650 °C, 60s, N2), (b) after high-temperature GIXRD to 750 °C, and (c) EDX linescan of sample (b).

Image of FIG. 12.
FIG. 12.

GIXRD scan of the 10:10 sample on silicon after rapid thermal annealing.


Generic image for table
Table I.

Used cycle numbers for nanolaminate deposition.


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Scitation: Synthesis of SrTiO3 by crystallization of SrO/TiO2 superlattices prepared by atomic layer deposition