(Color online) Initial growth of TiO2 and SrO on silicon. Surface coverage determined by RBS.
Cross-sectional bright field HRTEM Images of STO-2020 layers deposited on Si and Ru/TiN.
(Color online) XRR thickness of as-deposited STO films on Si and Ru. Filled symbols for STO-1010 samples. The film thickness on Ru films is significantly increased.
(Color online) Surface coverage of titanium (a) and strontium atoms (b) on Ru and Si substrates.
(Color online) Sr/Ti atomic ratio of as deposited films on different substrates determined by RBS and ERDA.
Correlation of the carbon signal to strontium signal derived by ERDA.
(Color online) XPS spectra (a) Sr 3d, (b) C 1s, (c) Ti 2p, and (d) O 1s of 20:20 sample on Si.
(Color online) XRR pattern of 10:10 sample on silicon, as deposited offset, annealing conditions: 650 °C N2 60 s.
(Color online) HT-GIXRD of 20:20 sample on ruthenium electrodes.
GIXRD diffractogram recorded after high-temperature GIXRD, cubic STO peaks as well as rutile TiO2 peaks are visible.
(Color online) TEM images of 10:10 samples (a) after rapid thermal annealing (650 °C, 60s, N2), (b) after high-temperature GIXRD to 750 °C, and (c) EDX linescan of sample (b).
GIXRD scan of the 10:10 sample on silicon after rapid thermal annealing.
Used cycle numbers for nanolaminate deposition.
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