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Uniaxial magnetic anisotropy for thin Co films on glass studied by magnetooptic Kerr effect
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10.1063/1.3576135
/content/aip/journal/jap/109/9/10.1063/1.3576135
http://aip.metastore.ingenta.com/content/aip/journal/jap/109/9/10.1063/1.3576135
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(Color online) XRR measurement of an exemplary Co film (dots, lower curve) and simulation of the data (solid line, upper curve) by means of the presented model (inset). Si cap: 3.6 nm thickness and 0.9 nm roughness; Co film: 11.2 nm thickness and 1.4 nm roughness; glass substrate: 0.9 nm roughness. The curves are shifted for clarity.

Image of FIG. 2.
FIG. 2.

(Color online) MOKE measurement of 50 nm Co on glass: magnetization curve along the magnetic easy axis at an azimuthal sample angle of (solid line) and along the magnetic hard axis at (dotted line) with respect to one common edge of the glass substrate.

Image of FIG. 3.
FIG. 3.

(Color online) Squareness plotted against the azimuthal sample angle for Co films with a thickness of (a) 50 and (b) 90 nm.

Image of FIG. 4.
FIG. 4.

(Color online) Squareness plotted against the azimuthal sample angle for Co films with a thickness of (a) 11.2 and (b) 14.5 nm.

Image of FIG. 5.
FIG. 5.

(Color online) (a) Projection of the in-plane magnetization in magnetic remanence to the plane of incidence of light. (b) Fitting function (solid line) for the relative magnetic remanence (squareness) of the 50 nm Co film plotted against the azimuthal sample angle (dots) using Eq. (1) with an amplitude , an offset and a phase .

Image of FIG. 6.
FIG. 6.

(Color online) Direction of the magnetic easy axis plotted against the Co film thickness for the ultra-thin Co films. (a) Direction with respect to one common substrate edge of the bigger glass plate, of which the substrates were cut out. (b) Direction with respect to the nearest substrate edge to test the influence of the shape anisotropy.

Image of FIG. 7.
FIG. 7.

Principle drawing of the GIWAXS geometry used. , : wavevector of the incident and diffracted x-ray beam, respectively, : angle of incidence of x-ray beam, : scattering angle of x-ray beam. (a) real space. (b) reciprocal space.

Image of FIG. 8.
FIG. 8.

(Color online) Diffraction pattern of the (a) amorphous 14.2 nm Co film and (b) polycrystalline 50 nm Co film. The upper section as indicated by white lines is azimuthally integrated in Fig. 9. Both patterns are measured for an azimuthal sample angle of . A: Amorphous Co Bragg reflection. B: Amorphous Si Bragg reflection. C: Polycrystalline Co Bragg reflection.

Image of FIG. 9.
FIG. 9.

(Color online) Azimuthally integrated intensity for the 50 nm Co film. The upper section as indicated by white lines in Fig. 8(b) is used for integration. The intensity is plotted against the diffraction angle for the azimuthal sample angle of . The hexagonal Bragg peaks are fitted with Gaussians.

Image of FIG. 10.
FIG. 10.

(Color online) (a) The integrated intensities of the Bragg peaks for the 50 nm Co film. (b) The lattice constants a and c calculated from the diffraction angle of the Bragg peak positions. (c) The average crystallite size S for the - and -oriented crystallites calculated from the FWHM of the Bragg peaks using Eq. (2). Circles: calculated from the () peak. Squares: calculated from the (0002) peak. Continuous vertical line: magnetic easy axis. Dashed vertical line: magnetic hard axis.

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/content/aip/journal/jap/109/9/10.1063/1.3576135
2011-05-05
2014-04-16
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Uniaxial magnetic anisotropy for thin Co films on glass studied by magnetooptic Kerr effect
http://aip.metastore.ingenta.com/content/aip/journal/jap/109/9/10.1063/1.3576135
10.1063/1.3576135
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