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Black thin film silicon
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/content/aip/journal/jap/110/4/10.1063/1.3626900
2011-08-31
2015-08-31

Abstract

“Black etching” has been proposed previously as a method for the nanoscale texturing of siliconsurfaces, which results in an almost complete suppression of reflectivity in the spectral range of absorption relevant for photovoltaics. The method modifies the topmost 150 to 300 nm of the material and thus also is applicable for thin films of silicon. The present work is focused on the optical effects induced by the black-etching treatment on hydrogenated amorphous and microcrystalline siliconthin films, in particular with respect to their application in solar cells. In addition to a strong reduction of the reflectivity, efficient light trapping within the modified thin films is found. The enhancement of the optical absorption due to the light trapping is investigated via photometric measurements and photothermal deflection spectroscopy. The correlation of the texture morphology (characterized via atomic force microscopy) with the optical effects is discussed in terms of an effective medium with gradually varying optical density and in the framework of the theory of statistical light trapping. Photoconductivity spectra directly show that the light trapping causes a significant prolongation of the light path within the black silicon films by up to 15 μm for ∼1 μm thick films, leading to a significant increase of the absorption in the red.

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Scitation: Black thin film silicon
http://aip.metastore.ingenta.com/content/aip/journal/jap/110/4/10.1063/1.3626900
10.1063/1.3626900
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