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Schottky barrier height tuning of silicides on p-type Si (100) by aluminum implantation and pulsed excimer laser anneal
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10.1063/1.3645018
/content/aip/journal/jap/110/7/10.1063/1.3645018
http://aip.metastore.ingenta.com/content/aip/journal/jap/110/7/10.1063/1.3645018
/content/aip/journal/jap/110/7/10.1063/1.3645018
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/content/aip/journal/jap/110/7/10.1063/1.3645018
2011-10-06
2014-07-30
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Schottky barrier height tuning of silicides on p-type Si (100) by aluminum implantation and pulsed excimer laser anneal
http://aip.metastore.ingenta.com/content/aip/journal/jap/110/7/10.1063/1.3645018
10.1063/1.3645018
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