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Microstructure analysis of novel ternary NiSi2−xAlx silicide layers on Si(001) formed by solid-state reaction
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10.1063/1.4718008
/content/aip/journal/jap/111/10/10.1063/1.4718008
http://aip.metastore.ingenta.com/content/aip/journal/jap/111/10/10.1063/1.4718008
/content/aip/journal/jap/111/10/10.1063/1.4718008
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/content/aip/journal/jap/111/10/10.1063/1.4718008
2012-05-18
2014-09-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Microstructure analysis of novel ternary NiSi2−xAlx silicide layers on Si(001) formed by solid-state reaction
http://aip.metastore.ingenta.com/content/aip/journal/jap/111/10/10.1063/1.4718008
10.1063/1.4718008
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