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Iron based microstrip phase shifter; optimization of phase shift
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10.1063/1.3672843
/content/aip/journal/jap/111/7/10.1063/1.3672843
http://aip.metastore.ingenta.com/content/aip/journal/jap/111/7/10.1063/1.3672843
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(Color online) Geometry of the experimental waveguide structure.

Image of FIG. 2.
FIG. 2.

(Color online) (a) Transmission S 21 parameters vs frequency for the structure with a 300 nm thick iron layer at different places inside the SiO2 dielectric layer. The value of the applied magnetic field is 1.1 kOe. (b) Maximum resonance absorption as a function of the position of the Fe film. (c) Theoretical results for S 12 vs frequency.

Image of FIG. 3.
FIG. 3.

(Color online) (a) S 21 phase vs frequency for structure with a 300 nm thick iron film at different places inside the SiO2 with an applied magnetic field of 1.1 kOe. (b) Differential phase shift for various microstrips vs Fe film position inside the SiO2 dielectric layer. (c) Theoretical results for S 21 phase vs frequency.

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/content/aip/journal/jap/111/7/10.1063/1.3672843
2012-02-17
2014-04-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Iron based microstrip phase shifter; optimization of phase shift
http://aip.metastore.ingenta.com/content/aip/journal/jap/111/7/10.1063/1.3672843
10.1063/1.3672843
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