(Color online) Experimental setup of the in situ MFM technique with a 300 N Deben™ tensile device. A magnetic field (150 Oe) is applied roughly along the stress axis thanks to permanent magnets. σtot is the stress applied to the film/substrate composite. The stress applied to the film itself, called σ, is deduced from analytical equation developed in precedent work.14 The MFM apparatus is a Veeco 3100.
XRD ω-2θ scan of the NiFe thin film deposited on flexible substrate.
Hysteresis loops obtained by VSM along (a) in-plane along the tensile axis, (b) out-of-plane direction.
(Color online) MFM images of magnetization configuration of NiFe film for different cases of applied field H (Oe) and applied stress σ (MPa). The two-way arrow indicates the stress axis.
Article metrics loading...
Full text loading...