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In situ tailoring of magnetization configuration in NiFe film deposited onto flexible substrate
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10.1063/1.3675613
/content/aip/journal/jap/111/7/10.1063/1.3675613
http://aip.metastore.ingenta.com/content/aip/journal/jap/111/7/10.1063/1.3675613
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Figures

Image of FIG. 1.
FIG. 1.

(Color online) Experimental setup of the in situ MFM technique with a 300 N Deben™ tensile device. A magnetic field (150 Oe) is applied roughly along the stress axis thanks to permanent magnets. σtot is the stress applied to the film/substrate composite. The stress applied to the film itself, called σ, is deduced from analytical equation developed in precedent work.14 The MFM apparatus is a Veeco 3100.

Image of FIG. 2.
FIG. 2.

XRD ω-2θ scan of the NiFe thin film deposited on flexible substrate.

Image of FIG. 3.
FIG. 3.

Hysteresis loops obtained by VSM along (a) in-plane along the tensile axis, (b) out-of-plane direction.

Image of FIG. 4.
FIG. 4.

(Color online) MFM images of magnetization configuration of NiFe film for different cases of applied field H (Oe) and applied stress σ (MPa). The two-way arrow indicates the stress axis.

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/content/aip/journal/jap/111/7/10.1063/1.3675613
2012-03-01
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: In situ tailoring of magnetization configuration in NiFe film deposited onto flexible substrate
http://aip.metastore.ingenta.com/content/aip/journal/jap/111/7/10.1063/1.3675613
10.1063/1.3675613
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