XRD patterns of AZO films deposited under 1% H2 GFR [H2/(Ar + H2)]. The halo pattern observed around 2θ = 20°–25° was from the glass substrate.
Electrical resistivity, Hall mobility, and carrier density of AZO films as a function of O2 or H2 GFR during deposition.
Electrical resistivity, Hall mobility, and carrier density measured in the ambient atmosphere of 100–300 K for the AZO film deposited under 1% H2 GFR.
Transmittance and reflectance from 190 to 2500 nm for AZO films deposited under 1% and 5% H2 GFRs and 0.5% O2 GFR.
Thermoreflectance signals of Mo/AZO/Mo three-layered films deposited under 0.5% O2 GFR and 1% H2 GFR.
Thermal diffusivity and electrical resistivity of AZO films deposited as a function of H2 or O2 GFR during deposition.
Thermal conductivity against electrical conductivity for AZO films (black square) deposited under various O2 or H2 GFRs. Thermal conductivity calculated using the Wiedemann–Franz law is shown by a solid line. For comparison, thermal conductivity of polycrystalline ITO (filled circle) (Ref.12), amorphous ITO (empty circle), and amorphous IZO films (empty triangle) (Ref. 13) is also plotted.
Indentation depth–load hysteresis curve for AZO films deposited under 1% H2 GFR, obtained by the nanoindentation measurement. This was measured three times in this study.
Thermal conductivity, electrical conductivity, and thermal conductivity carried by free electrons and phonons for AZO films.
Atomic mass ratio of metal and oxygen and lattice structure for AZO, ITO, and IZO.
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