(a) XRF spectra of MLM sample with Sn film (∼10 nm Sn) before and after the hydrogen plasma treatment. (b) Raman spectra of amorphous carbon films: (A) EUV-grown carbon of ∼10 nm, (B) magnetron-deposited carbon of ∼10 nm before plasma treatment, and (C) magnetron-deposited carbon of 1–2 nm after plasma treatment.
The experimental sets up used for the sample treatment in (a) hydrogen plasma and (b) afterglow.
H atoms density in the plasma discharge (squares) and afterglow (circles) as a function of H2 pressure at two RF powers—10 W and 40 W.
The removal rate of (a) Sn film and (b) С film in hydrogen plasma (open points) and its afterglow (dark points) as function of H atoms flux to the sample surface.
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