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Removal of amorphous C and Sn on Mo:Si multilayer mirror surface in Hydrogen plasma and afterglow
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10.1063/1.4709408
/content/aip/journal/jap/111/9/10.1063/1.4709408
http://aip.metastore.ingenta.com/content/aip/journal/jap/111/9/10.1063/1.4709408
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Figures

Image of FIG. 1.
FIG. 1.

(a) XRF spectra of MLM sample with Sn film (∼10 nm Sn) before and after the hydrogen plasma treatment. (b) Raman spectra of amorphous carbon films: (A) EUV-grown carbon of ∼10 nm, (B) magnetron-deposited carbon of ∼10 nm before plasma treatment, and (C) magnetron-deposited carbon of 1–2 nm after plasma treatment.

Image of FIG. 2.
FIG. 2.

The experimental sets up used for the sample treatment in (a) hydrogen plasma and (b) afterglow.

Image of FIG. 3.
FIG. 3.

H atoms density in the plasma discharge (squares) and afterglow (circles) as a function of H2 pressure at two RF powers—10 W and 40 W.

Image of FIG. 4.
FIG. 4.

The removal rate of (a) Sn film and (b) С film in hydrogen plasma (open points) and its afterglow (dark points) as function of H atoms flux to the sample surface.

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/content/aip/journal/jap/111/9/10.1063/1.4709408
2012-05-09
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Removal of amorphous C and Sn on Mo:Si multilayer mirror surface in Hydrogen plasma and afterglow
http://aip.metastore.ingenta.com/content/aip/journal/jap/111/9/10.1063/1.4709408
10.1063/1.4709408
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