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Radio-frequency superimposed direct current magnetron sputtered Ga:ZnO transparent conducting thin films
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10.1063/1.4709753
/content/aip/journal/jap/111/9/10.1063/1.4709753
http://aip.metastore.ingenta.com/content/aip/journal/jap/111/9/10.1063/1.4709753
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(a) Deposition rates and (b) Discharge voltage for different γrfdc from 0 to 1 and various PTot of 60, 80, 100, and 120 W, respectively. By varying γrfdc, similar deposition rate can be achieved at varying PTot.

Image of FIG. 2.
FIG. 2.

(a) XRD peaks for GZO films grown at PTot = 100 W with various γrfdc showing (002) peak characteristic of c-axis oriented zinc oxide with wurtzite structure and inset showing 2D diffraction image. No Ga2O3 peaks are evident (b) ZnO PDF. (c) Ga2O3 PDF.

Image of FIG. 3.
FIG. 3.

(a) χ for PTot of 100 W at various γrfdc. (b) FWHM on χ for PTot of 100 W and 120 W at various γrfdc. Films grown with more RF component have small FWHM.

Image of FIG. 4.
FIG. 4.

Hall data for various PTot and at varying γrfdc. Panels a, b, and c, respectively, show σ, N, and μ. Films grown with 50% or higher RF power portion have high μ.

Image of FIG. 5.
FIG. 5.

a) Total counts/thickness of the entire 002 peak, (b) σ vs FWHM χ, (c) μ vs FWHM χ for films grown at PTot of 100 W and 120 W at various γrfdc. Films with more structural order obtained with increased RF component, resulting in high σ and μ.

Image of FIG. 6.
FIG. 6.

Transmittance and Reflectance data for PTot = 100 W. Films have ∼90% transparency in visible spectrum. The insert shows (αhν)2 vs hν and Eopt (±0.02 eV).

Image of FIG. 7.
FIG. 7.

AFM image for PTot = 100 W: (a) γrfdc = 0 with Srms = 2.2 nm (b) γrfdc = 0.5 with Srms = 1.7 nm (c) γrfdc = 1 with Srms = 1.8 nm. Films grown with 50% or higher RF power portion have low Srms.

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/content/aip/journal/jap/111/9/10.1063/1.4709753
2012-05-08
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Radio-frequency superimposed direct current magnetron sputtered Ga:ZnO transparent conducting thin films
http://aip.metastore.ingenta.com/content/aip/journal/jap/111/9/10.1063/1.4709753
10.1063/1.4709753
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