(a) and (b) are RHEED images for a LCMO film grown on (110)-oriented LAO substrate at a nominal deposition temperature of 820 °C in an oxygen ambient of 25 Pa, observed along  and direction, respectively, after 5 min deposition at 1 Hz; (c) is the XRD precise measurement of the film (black line) around LAO (110) and the fitting result using Eq. (1) (green line).
Temperature dependence of the resistivity ρ for LCMO/STO (solid lines) and LCMO/LAO (dashed lines) films, measured with the electric current I applied along either  (black) or (red) direction, in zero field and 9 T. The field was perpendicular to the film surface.
Hysteresis loops at temperatures of 10 K and 85 K with the in-plane field applied along  (black) and (red) directions for (a) LCMO/STO; (b)LCMO/LAO. Insets: zoom-in of the hysteresis loops at low fields.
ZFC M-T curves for LCMO films grown on STO and LAO substrates (solid and dashed lines, respectively) in a field of 50 Oe applied along the  and the direction (black and red, respectively). The inset is an example of the high-field fitting of the M-H curves.
(a) and (c) are the field dependence of the resistivity for LCMO/STO and LCMO/LAO film, respectively, measured at different temperatures with I applied along either  (solid lines) or (dashed lines) direction. (b) and (d) are the corresponding field dependence of magnetoresistance calculated.
The low field part of Fig. 5(d), indicating the occurring of temperature dependent MR dips. The inset is the temperature dependence of the dip position.
Article metrics loading...
Full text loading...