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Crystalline silicon surface passivation by intrinsic silicon thin films deposited by low-frequency inductively coupled plasma
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10.1063/1.4733701
/content/aip/journal/jap/112/1/10.1063/1.4733701
http://aip.metastore.ingenta.com/content/aip/journal/jap/112/1/10.1063/1.4733701
/content/aip/journal/jap/112/1/10.1063/1.4733701
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/content/aip/journal/jap/112/1/10.1063/1.4733701
2012-07-06
2014-10-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Crystalline silicon surface passivation by intrinsic silicon thin films deposited by low-frequency inductively coupled plasma
http://aip.metastore.ingenta.com/content/aip/journal/jap/112/1/10.1063/1.4733701
10.1063/1.4733701
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