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Room-temperature remote-plasma sputtering of c-axis oriented zinc oxide thin films
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10.1063/1.4736541
/content/aip/journal/jap/112/1/10.1063/1.4736541
http://aip.metastore.ingenta.com/content/aip/journal/jap/112/1/10.1063/1.4736541

Figures

Image of FIG. 1.
FIG. 1.

Resistivity and deposition rate dependence on Ar:O2 flow ratio.

Image of FIG. 2.
FIG. 2.

(a) X-ray diffractogram of ZnO films of different thicknesses in a θ-2θ configuration. The series of features labelled with one and two * symbols correspond to substrate-related peaks due to contamination lines. The origin of the peak marked with a # symbol is unclear. (b) Rocking curve of the ZnO (0002) peaks. (c) Evolution of the FWHM of the rocking curve of the ZnO (0002) peak with ZnO film thickness. The dashed line is a guide to theeye.

Image of FIG. 3.
FIG. 3.

(a) Grain size vs. ZnO film thickness estimated by XRD. (b) SEM image of the surface of a typical ZnO film deposited and (c) close-up view of the framed area in (b), where grain sizes can be seen.

Image of FIG. 4.
FIG. 4.

AFM images of (a) 360 nm-thick, (b) 1390 nm-thick, and (c) 2800 nm-thick ZnO films deposited under conditions of maximum resistivity: (d) evolution of the surface roughness with film thickness. The dashed line is a guide to the eye.

Image of FIG. 5.
FIG. 5.

Comparison of the stress of ZnO films deposited with a standard magnetron sputtering system (before and after annealing)32 and with the remote plasma sputtering or HiTUS system. The dashed lines are a guide to the eye.

Image of FIG. 6.
FIG. 6.

Evolution of the RMS value of the surface roughness with the target power for a 2800 nm-thick ZnO film. The dashed line is a guide to the eye.

Image of FIG. 7.
FIG. 7.

Evolution of the stress with the target power for a 2800 nm-thick ZnO film. The dashed line is a guide to the eye.

Image of FIG. 8.
FIG. 8.

Evolution of the FWHM of the rocking curve with target bias of a 2800 nm thick ZnO film. The dashed line is a guide to the eye.

Tables

Generic image for table
Table I.

Comparison of main HiTUS features with other deposition systems.

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/content/aip/journal/jap/112/1/10.1063/1.4736541
2012-07-11
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Room-temperature remote-plasma sputtering of c-axis oriented zinc oxide thin films
http://aip.metastore.ingenta.com/content/aip/journal/jap/112/1/10.1063/1.4736541
10.1063/1.4736541
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