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Electrical and optical properties of Ta-Si-N thin films deposited by reactive magnetron sputtering
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10.1063/1.4766904
/content/aip/journal/jap/112/11/10.1063/1.4766904
http://aip.metastore.ingenta.com/content/aip/journal/jap/112/11/10.1063/1.4766904
/content/aip/journal/jap/112/11/10.1063/1.4766904
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/content/aip/journal/jap/112/11/10.1063/1.4766904
2012-12-03
2014-12-22
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Electrical and optical properties of Ta-Si-N thin films deposited by reactive magnetron sputtering
http://aip.metastore.ingenta.com/content/aip/journal/jap/112/11/10.1063/1.4766904
10.1063/1.4766904
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