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Understanding Si(111) solid phase epitaxial regrowth using Monte Carlo modeling: Bi-modal growth, defect formation, and interface topology
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10.1063/1.4739733
/content/aip/journal/jap/112/2/10.1063/1.4739733
http://aip.metastore.ingenta.com/content/aip/journal/jap/112/2/10.1063/1.4739733

Figures

Image of FIG. 1.
FIG. 1.

(a) Normal and (b) twin configurations lying on a Si(111) plane.

Image of FIG. 2.
FIG. 2.

Look up configurations. The center shows the substrate configuration surrounded by its twins. The twins are formed by the 60° rotation around one bond of the tetrahedron, and are displayed with different colors.

Image of FIG. 3.
FIG. 3.

Atomistic view of the simulated A/C interface and defect formation after few nanolayers of Si(111) recrystallization. Regular (blue) and twin (green) nano-islands form the A/C interface, leaving lines of defects (red and blue) forming stacking faults behind.

Image of FIG. 4.
FIG. 4.

Experimental data10 (solid lines) versus simulated results (symbols) for Si(100), Si(110), and Si(111) regrown distance with time. Results with different random seeds, together with its average (dashed line), are shown for Si(111). Our model can produce and explain the two different velocities (a) and (b) experimentally seen in Si(111) SPER.

Image of FIG. 5.
FIG. 5.

A/C interface evolution at 550 °C showing the transition between low and high Si(111) SPER velocities. Blue atoms belong to the substrate orientation, while green and red are twins. The formation of inclined twin (red atoms) produces the fast granular growth seen in experiments.10,23

Image of FIG. 6.
FIG. 6.

Simulated A/C interface topology for Si(111) substrates grown at 550 °C. Thin samples of Si(111) are quite uniform, while thick samples of Si(111) have increasing roughness, in agreement with experimental observations.10

Image of FIG. 7.
FIG. 7.

Formation of defects as shown in our Si(111) SPER simulations. Only the defective atoms, those without 4 bonds at the correct distances, are plotted. The simulation shows that the two phases of Si(111) produce two very different defect regimes. One with very dense, small, and parallel to the surface twin defects, and a second one with bigger but less dense inclined twin defects. This is in excellent agreement with experimental observations.23,31

Tables

Generic image for table
Table I.

Calibrated recrystallization parameters used in this work.

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/content/aip/journal/jap/112/2/10.1063/1.4739733
2012-07-31
2014-04-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Understanding Si(111) solid phase epitaxial regrowth using Monte Carlo modeling: Bi-modal growth, defect formation, and interface topology
http://aip.metastore.ingenta.com/content/aip/journal/jap/112/2/10.1063/1.4739733
10.1063/1.4739733
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