Chemical structure of PEDT:PSS and P(NDI2OD-2T).
Measured absorbance for spin coated P(NDI2OD-2T) films on fused silica (black dots) and on PEDT:PSS (red squares) for different film thickness. The film thickness was determined by AFM.
S2p core levels of the pristine PEDT:PSS substrate and for three P(NDI2OD-2T) films on top. The shaded dark grey area is the contribution of P(NDI2OD-2T) to the S2p signal.
UPS spectra of P(NDI2OD-2T) films with varying thickness (Θ) on PEDT:PSS before (black lines) and after in situ annealing at 120 °C for 30 min (gray lines): SECO (left side) and valence region (right side).
SECO and valance region of a HIL 1.3 electrode before and after deposition of a 6 nm P(NDI2OD-2T) film on top.
Energy level alignment at the (a) HIL1.3/P(NDI2OD-2T), (b) the Ca/CaOX/P(NDI2OD-2T), and at the PEDT:PSS/P(NDI2OD-2T) interface of (c) as-prepared and (d) and in situ annealed films.
SECO and valance region of a Ca film as prepared, after transfer into the glove box, and after deposition of a 3 nm P(NDI2OD-2T) film on top.
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